EBL is a high-resolution lithography technique that uses a focused electron beam to write patterns on an electron-sensitive resist. For CFL mold fabrication, EBL is used to create patterns with ...

Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for ...

C-Nano is ideal for characterizing all types of samples, but its high pixel resolution makes it suitable for comprehensive strain analyses as well as for routine work on complex and challenging ...