X-ray reflectivity (sometimes known as X-ray specular reflectivity, X-ray reflectometry, or XRR) is a surface-sensitive analytical technique used in chemistry, physics, and materials science to characterize surfaces, thin films and multilayers.
X-ray reflectivity Fresnel reflectivity: • Simples case of reflection of x-rays from a single interface • Solve Helmholtz equation: propagation of light through medium characterized by refractive index Solution = plane wave: 𝐸 =𝐴 ⋅ − :𝜔𝑡−𝐤𝑗 ; Electro-magnetic field must be continuous at the interface!
Ki is the direction of incident X-ray, pointing to sample. The recorded image is the reflected beam intensity image. Two methods get the similar result for Sb deposition on Si (100).
An accurate X-ray reflectivity curve is defined by clear appearances of the total reflection critical angle, the period and the amplitudes of the oscillation.
In this tutorial, we give an introduction to the principles of X-ray and neutron reflectivity. For applications of X-ray and neutron reflectivity to organic thin films, see [1,2]. For further technical details see the list of references.
What Is X-ray Reflectometry (XRR)? Used to determine thickness, density and roughness for single and multilayer stacks on semiconductor wafers, XRR analysis can be performed on both crystalline and amorphous materials.
How it works — an X-ray beam is reflected off of a sample at very small diffraction angles generating a reflectivity pattern. A simulation of the reflectivity pattern gives an accurate measurement of thickness, interface roughness, and layer density for either crystalline or amorphous thin films.